The formation of hard films using arc discharge is mainly metal nitrides.
These are conductive materials and by applying a negative voltage to the substrate,A hard film can be formed by the action of ions from the plasma.
Depending on what metal is selected for vapor deposition, the characteristics of the film change and the optimal application is different.
Generally, it exhibits wear resistance with a film thickness of about 3 microns.

Film type	TiN	TiCN	TiAlN	CrN	AlCrN	DLC
	TiN Titanium nitride	TiCN Titanium carbon nitride	TiAlN Titanium aluminum nitride	CrN Chromium nitride	AlCrN Aluminum chromium nitride	DLC diamond-like carbon
Color	Gold	Gray～Purple	Purple	Silver	Black Gray	Black
film thickness（μm）	2～4	2～4	2～4	2～4	2～4	0.1～20
Vickers hardness(Hv25gf)	1800～2200	2000～3000	2000～3000	1200～2200	2000～2500	15～70 (GPa)
Wear resistance	〇	◎High load sliding environment	◎High temperature cutting environment	◎High load sliding environment	◎High temperature cutting environment	◎Sliding environment
Heat resistance（℃）	600	500	800	800	900	450
Processing temperature（℃）	400～480	400～480	400～480	400～480	400～480	150～300
Application example	General cutting tools General-purpose molds	Punch/Die Sliding parts	High-speed cutting tools High-temperature molds	Machine parts/Engine parts Cr plating alternative	High-speed cutting tools high-temperature molds	Machine parts / Engine parts cutting tools
Film characteristics	general purpose Film	Low coefficient of friction high hardness	High temperature oxidation resistance	Abrasion resistance heat resistance	High temperature oxidation resistance	Low coefficient of friction high hardness

* In addition, the ITF coating machine can coat variety of films depending on the type and Layout of Evaporation source.